Fujifilm to invest Rs 800 cr in semiconductor materials manufacturing facility in India

New Delhi: Japanese firm Fujifilm plans to set up a greenfield semiconductor materials manufacturing facility in India with a total investment of around USD 83 million, or around Rs 800 crore, the company said on Wednesday.

The investments will be made in two phases starting from October 2026, according to the company. Commercial production at the greenfield manufacturing facility is expected in the fiscal year 2028.

"Fujifilm ...announced a landmark investment for a new greenfield semiconductor materials manufacturing facility in India. The project will follow a two-phase, staggered investment strategy aligned with industry growth and customer demand, with a total investment of approximately Rs 800 crore ( around USD 83 million)," the company said in a statement.


Under Phase 1 of the investment, the company will undertake a process to support front-end process chemicals, and Phase 2 of the investment will undertake the area of semiconductor surface conditioning materials and high-purity chemicals basis the actual pace of development of the semiconductor industry in the years to come.

"Fujifilm will work closely with the vision of the India Semiconductor Mission and seeks to utilise the patronage of the Government of India under the ISM 2.0 policy, which was approved by the Government of India in July 2026," the statement said.